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Darius Andriukaitis
Kaunas University of Technology, Lithuania

Alexander Argyros
The University of Sydney, Australia

Radu Arsinte
Technical University of Cluj Napoca, Romania

Ivan Baronak
Slovak University of Technology, Slovakia

Khosrow Behbehani
The University of Texas at Arlington, United States

Mohamed El Hachemi Benbouzid
University of Brest, France

Dalibor Biolek
University of Defence, Czech Republic

Klara Capova
University of Zilina, Slovakia

Ray-Guang Cheng
National Taiwan University of Science and Technology, Taiwan, Province of China

Erik Chromy
UPC Broadband Slovakia, Slovakia

Milan Dado
University of Zilina, Slovakia

Petr Drexler
Brno University of Technology, Czech Republic

Eva Gescheidtova
Brno University of Technology, Czech Republic

Gokhan Hakki Ilk
Ankara University, Turkey

Janusz Jezewski
Institute of Medical Technology and Equipment, Poland

Rene Kalus
VSB - Technical University of Ostrava, Czech Republic

Ivan Kasik
Academy of Sciences of the Czech Republic, Czech Republic

Jan Kohout
University of Defence, Czech Republic

Ondrej Krejcar
University of Hradec Kralove, Czech Republic

Zbigniew Leonowicz
Wroclaw University of Science and Technology, Poland

Miroslaw Luft
Technical University of Radom, Poland

Stanislav Marchevsky
Technical University of Kosice, Slovakia

Jerzy Mikulski
University of Economics in Katowice, Katowice, Poland

Karol Molnar
Honeywell International, Czech Republic

Miloslav Ohlidal
Brno University of Technology, Czech Republic

Neeta Pandey
Delhi Technological University, India

Alex Noel Joseph Raj
Shantou University, China

Marek Penhaker
VSB - Technical University of Ostrava, Czech Republic

Wasiu Oyewole Popoola
The University of Edinburgh, United Kingdom

Roman Prokop
Tomas Bata University in Zlin, Czech Republic

Karol Rastocny
University of Zilina, Slovakia

Marie Richterova
University of Defence, Czech Republic

Gheorghe Sebestyen-Pal
Technical University of Cluj Napoca, Romania

Sergey Vladimirovich Serebriannikov
National Research University "MPEI", Russian Federation

Yuriy Shmaliy
Guanajuato University, Mexico

Vladimir Schejbal
University of Pardubice, Czech Republic

Bohumil Skala
University of West Bohemia in Plzen, Czech Republic

Lorand Szabo
Technical University of Cluj Napoca, Romania

Adam Szelag
Warsaw University of Technology, Poland

Ahmadreza Tabesh
Isfahan University of Technology, Iran, Islamic Republic Of

Mauro Tropea
DIMES Department of University of Calabria, Italy

Viktor Valouch
Academy of Sciences of the Czech Republic, Czech Republic

Jiri Vodrazka
Czech Technical University in Prague, Czech Republic

Miroslav Voznak
VSB - Technical University of Ostrava, Czech Republic

He Wen
Hunan University, China

Otakar Wilfert
Brno University of Technology, Czech Republic

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Qualitative Assessment of the UV Exposition Process Near the Diffraction Limits

Agnieszka Zawadzka, Kornelia Indykiewicz, Regina Paszkiewicz

DOI: 10.15598/aeee.v18i2.3723


In the presented work the technological parameters that influence the shape of the resist structures are reported. The experimental results are compared with the simulations results, based on the solution of Maxwell’s equations using the RF module of COMSOL Multiphysics software. The electric field intensity distribution in the resist layer was analyzed for the mask slits that are larger and comparable to the applied wavelength. The differences in wave energy absorption in the resist layer are presented and discussed. For both cases, the impact of the chromium film thickness of the mask on the pattern profile of the resist is studied and the comparison is performed between the simulation and experimental results.


UV exposition; diffraction limits; simulations


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ZAWADZKA, A., J. PRAZMOWSKA, R. PASZKIEWICZ. Photolithographic Mask Fabrication Process Using Cr/Sapphire Carriers. Advances in Electrical and Electronic Engineering. 2019, vol. 17, no. 3, pp. 374-378. ISSN 18043119. DOI: 10.15598/aeee.v17i3.3357.

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